exposure technique meaning in Chinese
露光技术, 投照技术
投照技术
Examples
- This calibration is usually carried out by employing a double exposure technique in which the diffraction pattern and electron image of a crystal of molybdenum trioxide are successively exposed
这个标准通常利用使得衍射模型和一个三氧化钼的结晶体的电子成像成功展现的双投照技术来执行。 - This inversion will lead to an additional 1800 relative rotation between the diffraction pattern and micrograph that would not be detectable in the double exposure technique illustrated in fig . l . 3
图表1 . 3所示的双曝光技术中对于衍射模型和显微图并没有表示出来，这个倒置，就在衍射模型和显微图之间形成了一个额外的1800相关旋转。 - Mathematical and physical models for multi - beam and multiple - exposure techniques including single exposure with double - beam , double - exposure with double - beam , single exposure with tri - beam , double - exposure with tri - beam , four - beam and five - beam interference are established . simulation software is programmed , large numbers of computer simulation research have been carried out and a lot of useful results have been obtained
建立了多光束、多曝光技术，包括双光束单曝光、双光束双曝光、三光束单曝光、三光束双曝光、四光束和五光束干涉的数学物理模型，编制了模拟软件并进行了大量的计算模拟研究，得到很多有用的结果。 - Owning to the erasing effect , the correlation spots have not the same brightness if the holograms were exposed with the same times while recording . the correlation spot that related to the late recorded hologram is brighter than that related to the previous one . this problem can be solved by a subsequence exposure technique using in holograms receding
本论文的研究发现，由于后记录全息图的写入光束对先存全息图的擦除效应，如果采用等时曝光法记录几百至上千幅全息图，那么相关点亮度将会变得均匀不一，后存比先存全息图的相关点总体上要亮，而采用顺序曝光法来记录全息图，就可以消除由擦除效应带来的相关点亮度不均匀的问题。